Hatsuo Osada

Title: Innovations of Hatsuo Osada

Introduction

Hatsuo Osada is a notable inventor based in Yamanashi, Japan. He has made significant contributions to the field of gas processing technology, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of gas processing apparatuses.

Latest Patents

Osada's latest patents include a baffle plate, an apparatus for producing the same, a method of producing the same, and a gas processing apparatus containing a baffle plate. The present invention provides a gas processing apparatus that realizes uniform exhaust without depending on process conditions. It features a gas process chamber that constitutes the gas processing apparatus, along with a baffle plate mounted on the gas process chamber. The baffle plate serves as a partition between a process space, where a chemical process is carried out with a supplied gas, and a duct that discharges exhaust gas generated from the chemical process. The design of the baffle plate includes baffle holes disposed at various locations, which are influenced by the pressure differences on both sides of the plate.

Career Highlights

Throughout his career, Hatsuo Osada has worked with prominent companies such as Tokyo Electron Limited and Varian Medical Systems. His experience in these organizations has allowed him to develop and refine his innovative ideas in gas processing technology.

Collaborations

Osada has collaborated with notable colleagues, including Kimihiro Matsuse and Hideki Lee. Their combined expertise has contributed to the advancement of the technologies they have worked on together.

Conclusion

Hatsuo Osada's contributions to gas processing technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative designs continue to impact the industry positively.