The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Dec. 21, 2000
Taro Komiya, Takarazuka, JP;
Hatsuo Osada, Nirasaki, JP;
Shigetoshi Hosaka, Nirasaki, JP;
Tomihiro Yonenaga, Nirasaki, JP;
Masayuki Tomoyasu, Nirasaki, JP;
Taro Komiya, Takarazuka, JP;
Hatsuo Osada, Nirasaki, JP;
Shigetoshi Hosaka, Nirasaki, JP;
Tomihiro Yonenaga, Nirasaki, JP;
Masayuki Tomoyasu, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The present invention provides a gas process apparatus that realizes uniform exhaust without depending on process conditions, a gas process chamber that constitutes the gas process apparatus, a baffle plate mounted on the gas process chamber, a method of producing the baffle plate, and an apparatus for producing the baffle plate. The baffle plate of the present invention serves as a partition between a process space in which a chemical process is carried out with a supplied gas, and a duct that is adjacent to the process space and functions to discharge exhaust gas generated as a result of the chemical process. In accordance with the difference between the pressures on both sides of the baffle plate, which difference varies depending on the location on the baffle plate, the baffle holes are disposed on a plurality of locations on the baffle plate.