This inventor holds 1 USPTO granted patent. Top assignee: Anelva Corporation. Active years: 1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1992
Title: Haruyuki Kochi: Innovator in Magnetron Sputtering Technology
Introduction
Haruyuki Kochi is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of thin film deposition technology. His innovative work has led to the development of a unique magnetron sputtering apparatus.
Latest Patents
Kochi holds a patent for a magnetron sputtering apparatus and thin film depositing method. This invention enhances the strength of the rotating magnetic field around the center area of a target during sputtering. It effectively reduces dust particles that may settle on the target area, preventing defects such as pinholes in the thin film deposited on wafers.
Career Highlights
Kochi's career is marked by his dedication to advancing sputtering technology. His work has improved the step coverage for contact holes formed in individual substrates of wafers. This innovation has substantially eliminated irregularities, enhancing the quality of thin films.
Collaborations
Kochi has collaborated with esteemed colleagues, including Nobuyuki Takahashi and Yasuhiko Akao. Their combined expertise has contributed to the success of various projects within the field.
Conclusion
Haruyuki Kochi's contributions to magnetron sputtering technology have made a significant impact on the industry. His innovative patent reflects his commitment to improving thin film deposition methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile