Oshu, Japan

Haruoki Nakamura

This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2012-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruoki Nakamura. Retrieved from https://idiyas.com/inventor/haruoki-nakamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 33.3

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2012-2013

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3 patents (USPTO):Explore Patents

Title: Haruoki Nakamura: Innovator in Substrate Processing Technology

Introduction

Haruoki Nakamura is a prominent inventor based in Oshu, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His innovative approaches have enhanced the accuracy and efficiency of substrate processing apparatuses.

Latest Patents

Nakamura's latest patents include a method for teaching carrier means, storage medium, and substrate processing apparatus. This invention focuses on improving the positioning of a carrier onto a table within a substrate processing apparatus. The process involves using a carrier jig that holds the same shape as the carrier, equipped with a camera to ensure precise alignment. By calculating the positional shift between the preset lowering start position and the ideal position, the system corrects the lowering start position, allowing for accurate placement of the carrier.

Career Highlights

Haruoki Nakamura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing technologies that support the production of high-quality semiconductor devices.

Collaborations

Nakamura has collaborated with notable colleagues, including Masayuki Enomoto and Takashi Asakawa. Their combined expertise has contributed to the development of innovative solutions in substrate processing.

Conclusion

Haruoki Nakamura's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patents reflect a commitment to enhancing precision and efficiency in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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