Haruko Ono

Title: Innovations by Haruko Ono: Pioneering Substrate Processing Solutions

Introduction

Haruko Ono is a notable inventor based in Tokyo, Japan, known for his contributions to the field of substrate processing. With a total of three patents to his name, Ono has developed methods and apparatuses that enhance the cleaning and processing of substrates, particularly in industrial applications.

Latest Patents

Ono's recent innovations include two significant patents focused on improving the efficiency and effectiveness of substrate cleaning. The first patent, titled "Method and apparatus for cleaning substrate," describes a unique scrubbing process involving a roll-shaped cleaning member. This process involves performing the scrubbing while ensuring that the cleaning member maintains contact with the substrate over a predetermined width. The innovative aspect lies in the ability to alternate the cleaning position, which allows for a more uniform cleaning intensity across the substrate's surface.

The second patent, "Apparatus for and method of processing substrate," outlines an apparatus designed for spin-drying substrates without contamination from processing liquids. This novel apparatus includes a substrate holder for rotation, a scattering prevention cup that encircles the substrate to minimize contamination, and a built-in cleaner for the cup’s inner walls, ensuring that the cleaning process remains unhindered by external factors.

Career Highlights

Haruko Ono is currently associated with Ebara Corporation, a prominent name in the field of industrial machinery and equipment. His work at Ebara has been instrumental in advancing substrate processing technologies, allowing for improved manufacturing processes across various industries.

Collaborations

Throughout his career, Ono has collaborated with talented colleagues, including Ichiro Katakabe and Sachiko Takeda. Their combined expertise has fostered a collaborative environment that drives innovation and optimizes the development of substrate processing solutions.

Conclusion

In conclusion, Haruko Ono's contributions through his patents not only exemplify his ingenuity as an inventor but also reflect the ongoing advancements in substrate processing technology. His work continues to influence the industry, preparing the way for future innovations in this critical field.