The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
Jan. 28, 2004
Shinji Kajita, Tokyo, JP;
Ichiro Katakabe, Tokyo, JP;
Haruko Ono, Tokyo, JP;
Yuki Inoue, Tokyo, JP;
Sachiko Takeda, Tokyo, JP;
Shinji Kajita, Tokyo, JP;
Ichiro Katakabe, Tokyo, JP;
Haruko Ono, Tokyo, JP;
Yuki Inoue, Tokyo, JP;
Sachiko Takeda, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
An apparatus for processing a substrate through successive steps including spin-drying the substrate with a single processing facility while preventing the substrate from being contaminated by a substrate processing liquid, etc. The apparatus for processing a substrate includes a substrate holder for holding and rotating a substrate, a scattering prevention cup for circumferentially surrounding the substrate held by the substrate holder to prevent a substrate processing liquid supplied to the substrate from being scattered around, and a scattering prevention cup cleaner for cleaning an inner wall surface of the scattering prevention cup.