Haruhiko Tanaka

Title: Haruhiko Tanaka: Innovator in Semiconductor Technology

Introduction

Haruhiko Tanaka is a prominent inventor based in Kokubunji, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the manufacturing processes of semiconductor devices, which are crucial for modern electronics.

Latest Patents

Tanaka's latest patents include innovative methods for manufacturing semiconductor devices. One notable patent is for a method of manufacturing a semiconductor device having silicon islands. This invention allows for the creation of semiconductor devices, such as field-effect transistors (FETs) or charge-coupled devices, that maintain the necessary amount of electric current while minimizing the size of the device. The design enhances the electric characteristics and integration of semiconductor memory devices.

Another significant patent is for an improved method for manufacturing insulated gate field-effect transistors. This method involves a series of steps, including the growth of silicon oxide films and the deposition of silicon nitride films, to create silicon islands that are electrically separated from the substrate. This process is essential for developing high-performance semiconductor devices.

Career Highlights

Haruhiko Tanaka is associated with Hitachi, Ltd., a leading company in the technology sector. His work at Hitachi has allowed him to contribute to advancements in semiconductor technology, making a lasting impact on the industry.

Collaborations

Tanaka has collaborated with notable coworkers, including Dai Hisamoto and Toru Kaga. Their combined expertise has fostered innovation and development in semiconductor manufacturing processes.

Conclusion

Haruhiko Tanaka's contributions to semiconductor technology through his patents and work at Hitachi, Ltd. highlight his role as a key innovator in the field. His advancements continue to influence the development of modern electronic devices.