Nara, Japan

Haruhiko Matsuura

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 3.2

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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6 patents (USPTO):Explore Patents

Title: Haruhiko Matsuura: Innovator in Hollow Particle Technology

Introduction

Haruhiko Matsuura is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of materials science, particularly in the development of hollow particles. With a total of six patents to his name, Matsuura's work has garnered attention for its innovative applications and potential impact on various industries.

Latest Patents

Matsuura's latest patents include groundbreaking technologies related to hollow particles. One of his notable inventions is titled "Hollow particles and use thereof," which describes hollow particles featuring a shell that includes at least one layer composed of a vinyl-based resin, incorporating a phosphorus atom and/or a sulfur atom. Another significant patent is "Hollow particles and use of same," which details hollow particles with a shell made of at least one layer containing a nitrogen atom-containing resin that has a refractive index of 1.57 or less. These inventions highlight Matsuura's expertise in creating advanced materials with unique properties.

Career Highlights

Haruhiko Matsuura is currently employed at Sekisui Plastics Co., Ltd., where he continues to innovate and develop new technologies. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to materials science.

Collaborations

Matsuura has worked alongside notable colleagues such as Yugo Katayama and Hironori Kobayashi. Their collaborative efforts have played a crucial role in advancing the research and development of hollow particle technologies.

Conclusion

Haruhiko Matsuura's contributions to the field of hollow particle technology demonstrate his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to creating new solutions that can have a lasting impact on various applications.

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