Company Filing History:
Years Active: 2015-2023
Title: Harry Christov: Innovator in Substrate Cleaning Technologies
Introduction
Harry Christov is a prominent inventor based in Campbell, CA (US). He has made significant contributions to the field of substrate cleaning technologies, holding a total of 7 patents. His innovative approaches have paved the way for advancements in the semiconductor industry.
Latest Patents
One of Harry Christov's latest patents is a subnanometer-level light-based substrate cleaning mechanism. This invention comprises various embodiments that include apparatuses and related methods for effectively cleaning a substrate. In one embodiment, the apparatus features a substrate holder that can hold and rotate the substrate at various speeds. An optional inner shield and an optional outer shield surround the substrate holder during operation, allowing for independent control of rotational speed and direction. The design incorporates both front-side and back-side lasers to clean the substrate's surfaces and edges concurrently or independently. Additionally, a gas flow, combined with high rotational speeds, assists in removing effluents from the substrate, enhancing the cleaning process.
Career Highlights
Harry Christov has established himself as a key figure in the semiconductor industry through his work at Planar Semiconductor, Inc. His innovative spirit and technical expertise have led to the development of cutting-edge cleaning technologies that are essential for maintaining the quality of semiconductor substrates.
Collaborations
Throughout his career, Harry has collaborated with notable professionals in the field, including Rubinder S Randhawa and Shmuel Erez. These collaborations have further enriched his work and contributed to the advancement of substrate cleaning technologies.
Conclusion
Harry Christov's contributions to substrate cleaning technologies exemplify his dedication to innovation and excellence in the semiconductor industry. His patents and collaborative efforts continue to influence the field, ensuring cleaner and more efficient substrate processing.