Tilburg, Netherlands

Harm Visscher

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Mitutoyo Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harm Visscher. Retrieved from https://idiyas.com/inventor/harm-visscher

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Harm Visscher: Innovator in High Accuracy Measurement Technologies

Introduction

Harm Visscher is a notable inventor based in Tilburg, Netherlands. He has made significant contributions to the field of measurement technologies, particularly in developing methods for creating high accuracy height maps of test surfaces. His innovative approach has implications for various industries that require precise surface measurements.

Latest Patents

Harm Visscher holds a patent for a "Method for measuring a high accuracy height map of a test surface." This method involves several steps, including measuring a coarse height map with a pre-map sensor, storing the data, and using a high-resolution optical profiler to achieve precise measurements. The process includes calculating X, Y, and Z positions and moving the optical profiler accordingly to ensure accuracy.

Career Highlights

Throughout his career, Visscher has worked with prominent companies such as Mitutoyo Corporation and Solarge Holding B.V. His experience in these organizations has allowed him to refine his skills and contribute to advancements in measurement technologies.

Collaborations

Harm Visscher has collaborated with notable professionals in his field, including Adriaan Tiemen Zuiderweg and Johannes Anna Quaedackers. These collaborations have further enhanced his work and innovation in measurement techniques.

Conclusion

Harm Visscher's contributions to high accuracy measurement technologies demonstrate his expertise and commitment to innovation. His patent and career achievements reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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