Bengaluru, India

Harish Ravikumar

This inventor holds 1 USPTO granted patent. Top assignee: Yield Engineering Systems, Inc.. Active years: 2026.


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Harish Ravikumar: Innovator in Cleaning Technology

Introduction

Harish Ravikumar is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of cleaning technology through his innovative designs and methods. His work focuses on enhancing the efficiency of cleaning processes, which is crucial in various industries.

Latest Patents

Harish holds a patent for a "Unified rinse and dry cleaning apparatus and methods." This cleaning apparatus includes a plurality of tubes with angled orifices. An angled liquid stream is directed through the orifices to impinge on a surface of a substrate, effectively cleaning the surface as the substrate moves in one direction through the space between a pair of tubes. Following this, an angled gas stream is directed through the orifices to dry the surface as the substrate moves in the opposite direction between the pair of tubes. This innovative approach streamlines the cleaning and drying process, making it more efficient.

Career Highlights

Harish is currently employed at Yield Engineering Systems, Inc., where he continues to develop and refine cleaning technologies. His work has garnered attention for its practical applications and effectiveness in various cleaning scenarios.

Collaborations

Harish collaborates with talented professionals in his field, including Arvind Patil and Sanjay Kumar. Their teamwork fosters an environment of innovation and creativity, leading to advancements in cleaning technology.

Conclusion

Harish Ravikumar is a pioneering inventor whose work in cleaning technology has the potential to revolutionize the industry. His patented apparatus demonstrates his commitment to innovation and efficiency in cleaning processes.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…