Tamil Nadu, India

Hari Venkatesh Rajendran

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hari Venkatesh Rajendran. Retrieved from https://idiyas.com/inventor/hari-venkatesh-rajendran

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Innovations by Hari Venkatesh Rajendran

Introduction

Hari Venkatesh Rajendran is an accomplished inventor based in Tamil Nadu, India. He has made significant contributions to the field of atomic layer deposition, showcasing his expertise through his innovative patent.

Latest Patents

Rajendran holds a patent for a method titled "Parallel atomic layer deposition of target element interiors." This method involves performing an atomic layer deposition (ALD) process with respect to multiple target elements. The process includes coating the interiors of these target elements with a protective layer. It consists of alternating the delivery of a first precursor to form an adsorption layer, purging the first precursor, and then delivering a second precursor to react with the adsorption layer, ultimately forming a target layer.

Career Highlights

Rajendran is currently employed at Applied Materials, Inc., where he continues to work on advanced technologies in the field of materials science. His innovative approach and dedication to research have positioned him as a valuable asset in his organization.

Collaborations

He collaborates with talented coworkers, including Yogesh Tomar and Nikshep Patil, who contribute to the innovative environment at Applied Materials, Inc.

Conclusion

Hari Venkatesh Rajendran's work exemplifies the spirit of innovation in the field of atomic layer deposition. His contributions are paving the way for advancements in material coatings and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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