The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Jul. 18, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Yogesh Tomar, Madhya Pradesh, IN;
Nikshep Patil, Hubballi, IN;
Kirubanandan Shanmugam Naina, Bangalore, IN;
Hanish Kumar Panavalappil Kumarankutty, Karnataka, IN;
Gayatri Natu, Maharashtra, IN;
Mahesh Chelvaraj Arcot, Maharashtra, IN;
Senthil Kumar Nattamai Subramanian, Hosur, IN;
Hari Venkatesh Rajendran, Tamil Nadu, IN;
Michael Rice, Pleasanton, CA (US);
Christopher Laurent Beaudry, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method includes performing an atomic layer deposition (ALD) process with respect to a plurality of target elements to coat interiors of the plurality of target elements with a protective coating. Performing the ALD process includes alternating delivery of a first precursor inside the plurality of target elements for a first duration to form an adsorption layer on the interiors of the plurality of target elements, alternating purging of the first precursor from the plurality of target elements for a second duration, and alternating delivery of a second precursor inside the plurality of target elements for a third duration to cause the second precursor to react with the adsorption layer and form a target layer on the interiors of the plurality of target elements.