Company Filing History:
Years Active: 2025
Title: Nikshep Patil: Innovator in Atomic Layer Deposition Technology
Introduction
Nikshep Patil is a notable inventor based in Hubballi, India. He has made significant contributions to the field of atomic layer deposition (ALD) technology. His innovative approach has led to the development of a unique method that enhances the efficiency of coating target elements.
Latest Patents
Nikshep Patil holds 1 patent for his invention titled "Parallel atomic layer deposition of target element interiors." This method involves performing an ALD process to coat the interiors of multiple target elements with a protective layer. The process includes alternating the delivery of a first precursor to form an adsorption layer, purging the first precursor, and then delivering a second precursor to react with the adsorption layer, ultimately forming a target layer.
Career Highlights
Nikshep is currently employed at Applied Materials, Inc., where he continues to work on advancements in deposition technologies. His expertise in ALD has positioned him as a valuable asset in the field of materials science.
Collaborations
He collaborates with talented coworkers, including Yogesh Tomar and Kirubanandan Shanmugam Naina. Their combined efforts contribute to the innovative projects at Applied Materials, Inc.
Conclusion
Nikshep Patil's work in atomic layer deposition represents a significant advancement in the field, showcasing his dedication to innovation and technology. His contributions are paving the way for future developments in material coatings.
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