Mahesh Arcot

Title: Mahesh Arcot - Innovator in Atomic Layer Deposition and Component Prequalification

Introduction

Mahesh Arcot is a prominent inventor based in Maharashtra, India, known for his significant contributions to the field of atomic layer deposition and component prequalification systems. With a total of four patents to his name, he has made remarkable advancements in technology that enhance the efficiency and effectiveness of various processes.

Latest Patents

One of his latest patents is titled "Parallel atomic layer deposition of target element interiors." This innovative method involves performing an atomic layer deposition (ALD) process to coat the interiors of multiple target elements with a protective layer. The process includes alternating the delivery of a first precursor to form an adsorption layer, purging the precursor, and then delivering a second precursor to react with the adsorption layer, resulting in a target layer on the interiors.

Another notable patent is "Methods and systems for liquid particle prequalification." This system is designed to prequalify components for a processing chamber by cleaning particulates and quantifying cleanliness. It features three adjacent compartments filled with liquid, where a submerged component is cleaned and qualified using ultrasonic energy delivered from submerged transducers.

Career Highlights

Mahesh Arcot is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on developing advanced technologies that improve manufacturing processes and product quality.

Collaborations

Throughout his career