Company Filing History:
Years Active: 2025
Title: Kirubanandan Shanmugam Naina - Innovator in Atomic Layer Deposition
Introduction
Kirubanandan Shanmugam Naina is a prominent inventor based in Bengaluru, India. He has made significant contributions to the field of atomic layer deposition, particularly through his innovative methods that enhance the coating processes of target elements.
Latest Patents
Naina holds a patent for a method titled "Parallel atomic layer deposition of target element interiors." This patent describes a process that involves performing an atomic layer deposition (ALD) to coat the interiors of multiple target elements with a protective layer. The method includes alternating the delivery of precursors and purging processes to ensure effective coating.
Career Highlights
Naina is currently employed at Applied Materials, Inc., where he applies his expertise in atomic layer deposition technologies. His work focuses on advancing the capabilities of ALD processes, which are crucial in various applications, including semiconductor manufacturing.
Collaborations
Throughout his career, Naina has collaborated with talented professionals such as Yogesh Tomar and Nikshep Patil. These collaborations have fostered innovation and contributed to the development of cutting-edge technologies in the field.
Conclusion
Kirubanandan Shanmugam Naina's contributions to atomic layer deposition and his innovative patent demonstrate his commitment to advancing technology. His work at Applied Materials, Inc. and collaborations with fellow professionals highlight his
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