Applied Materials, Inc.

Kirubanandan Shanmugam Naina

Michael Robert Rice

Christopher L Beaudry

Hanish Kumar Panavalappil Kumarankutty

Gayatri Natu

Mahesh Arcot

Senthil Kumar Nattamai Subramanian

Hari Venkatesh Rajendran

Yogesh Tomar

A method includes performing an atomic layer deposition (ALD) process with respect to a plurality of target elements to coat interiors of the plurality of target elements with a protective coating. Performing the ALD process includes alternating delivery of a first precursor inside the plurality of target elements for a first duration to form an adsorption layer on the interiors of the plurality of target elements, alternating purging of the first precursor from the plurality of target elements for a second duration, and alternating delivery of a second precursor inside the plurality of target elements for a third duration to cause the second precursor to react with the adsorption layer and form a target layer on the interiors of the plurality of target elements.

Parallel atomic layer deposition of target element interiors

Growing community of inventors

Bengaluru, India

Kirubanandan Shanmugam Naina