Rehovot, Israel

Harel Azulay

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials Israel Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harel Azulay. Retrieved from https://idiyas.com/inventor/harel-azulay

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Harel Azulay and Charged-Particle Overlay Measurement

Introduction

Harel Azulay is an inventor based in Rehovot, Israel. His work includes a patented method for improving overlay measurement in charged-particle systems. He is associated with Applied Materials Israel Limited and holds 1 patent.

Latest Patents

Azulay’s patent, “Overlay Target Measurement and Shift Compensation in Charged Particle Systems and Related Methods,” addresses differences in response times among sensor types in a charged-particle system. The method obtains secondary-electron and backscattered-electron images of an overlay target using two scan patterns. By registering the first images with rotated versions of the second images, the system determines shifts for each image type and calculates a compensation shift. The approach uses a pixel grab period shorter than the response period of the backscattered-electron sensor.

Career Highlights

Azulay’s patent focuses on accurate overlay measurement and compensation in charged-particle systems. This work is associated with Applied Materials Israel Limited, which develops technologies for the semiconductor industry.

Collaborations

Azulay’s listed coworkers include Igor Isakov and Assaf Duvdevan.

Conclusion

Harel Azulay’s patented method combines image registration and shift compensation to address sensor-response differences in charged-particle overlay measurement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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