Hubei, China

Hao Jiang

USPTO Granted Patents = 8 

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Wuhan, CN (2020 - 2022)
  • Hubei, CN (2021 - 2023)

Company Filing History:


Years Active: 2020-2023

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8 patents (USPTO):

Title: Hao Jiang: Innovator in Optical Technologies

Introduction

Hao Jiang is a prominent inventor based in Hubei, China, known for his significant contributions to optical technologies. With a total of 8 patents to his name, he has made remarkable advancements in the field of lithography and ultra-thin film measurements.

Latest Patents

Hao Jiang's latest patents include a method and system for correcting lithography process hotspots based on stress damping adjustment. This innovative method involves acquiring a mark hotspot of a mask pattern and forming concentric annuli around it. By adjusting the vertexes of the mask pattern, the updated layout is verified for electrical characteristics, ensuring precision in lithography processes. Another notable patent is a rapid measurement method for ultra-thin film optical constants. This method utilizes amplitude reflection coefficients to derive a quartic equation, allowing for quick and accurate measurements of optical constants in ultra-thin films.

Career Highlights

Hao Jiang has worked at esteemed institutions such as Huazhong University of Science and Technology and Wuhan Yuwei Optical Software Co., Ltd. His experience in these organizations has contributed to his expertise in optical technologies and innovation.

Collaborations

Throughout his career, Hao Jiang has collaborated with notable colleagues, including Shiyuan Liu and Honggang Gu. These partnerships have fostered a collaborative environment that enhances research and development in optical technologies.

Conclusion

Hao Jiang's contributions to the field of optical technologies through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to advance the industry and inspire future developments.

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