Hao Chun Yang

Title: Hao Chun Yang - Innovator in Semiconductor Technology

Introduction

Hao Chun Yang is an inventor based in Taipei, Taiwan. He is known for his contributions to semiconductor technology, particularly in the field of defect inspection and microelectromechanical systems (MEMS). Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Hao Chun Yang has submitted several notable patent applications. One of his latest applications is for a "Defect Inspection System and Method." This method involves directing light at a first side of a semiconductor structure and detecting a first light intensity at a second side of the semiconductor structure. The first light intensity corresponds to the light that penetrated the semiconductor structure from the first side to the second side. The method also includes comparing the first light intensity to a second light intensity, which corresponds to an expected intensity of light.

Another significant application is for "Semiconductor Devices and Methods of Manufacture." This application presents microelectromechanical devices and methods of manufacture. The embodiments include bonding a mask substrate to a first MEMS device. After bonding, the mask substrate is patterned, and a first conductive pillar is formed within the mask substrate. A second conductive pillar is also formed within the mask substrate, with a different height from the first conductive pillar. The mask substrate is then removed, showcasing the innovative approach to MEMS manufacturing.

Conclusion

Hao Chun Yang is an emerging inventor in the semiconductor field, with promising patent applications that highlight his innovative methods and technologies. His work in defect inspection and MEMS manufacturing demonstrates his potential to contribute significantly to the industry in the future.