Hans Opower

This inventor holds 40 USPTO granted patents and 1 published patent application and 4 EPO patents, primarily in Lithography Systems. Top assignees: Deutsche Forschungsanstalt Fuer Luft- Und Raumfahrt E.v., Deutsches Zentrum Fuer Luft-Und Raumfahrt E.v, W.c. Heraeus Gmbh. Active years: 1985-2014.

USPTO Granted Patents = 40 (Patent Applications = 1)

% Patents Active = 77.5

EPO Patents = 4

Average Co-Inventor Count = 1.6

ph-index = 11

Forward Citations = 398(Granted Patents)

Location History:

Krailing, DE (1986)
Krailling, DE (1985 - 2014)

Company Filing History:

16 out of 70

Deutsche Forschungsanstalt Fuer Luft- Und Raumfahrt E.v.

patents

5 out of 154

Deutsches Zentrum Fuer Luft-Und Raumfahrt E.v

Deutsche Forschungsanstalt Fur Luft-Und Raumfahrt E.v.

patents

5. 3 out of 3

Kleo Halbleitertechnik Gmbh & Co Kg

Universitaet Stuttgart Institut Fuer Strahlwerkzeuge

patents

8. 1 out of 1

Deutsche Forschung -Und Versuchsanstalt

patent

9. 1 out of 2

Deutsche Forschungsanstalt

patents

10. 1 out of 5

Institut Fuer Mikroelektronik Stuttgart

patents

11. 1 out of 1

Kleo Halbleitertechnik Bmbh & Co Kg

patent

12. 1 out of 1

Kleo Halbleitertechnik Gmbh

Universitaet Stuttgart Institut Fuer Strahlwerkqeuge

patent

15. 1 out of 1

Universitaet Stuttgart Institut Fur Strahlwerkzeuge

patent

16. 1 out of 1

Voest-Alpine Stahl Linz Gmbh

patent

17. 1 out of 834,350

Other

patents

where one patent can have more than one assignee

Years Active: 1985-2014

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Areas of Expertise:

Lithography Exposure Device

Laser Radiation Source

Image Generation

Epitaxial Layer Production

Fractal Laser System

Waveguide Laser

Gas Laser Structure

Material Working Apparatus

Coating Process

Substrate Materials

Radiation Sources

40 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8811665 - Processing system (2014-08-19),

2. 8314921 - Exposure apparatus (2012-11-20),

3. 8248581 - Exposure system (2012-08-21),

4. 8027018 - Method and device for producing exposed structures (2011-09-27),

5. 7705967 - Exposure system (2010-04-27),

6. 7652750 - Lithography exposure device having a plurality of radiation sources (2010-01-26),

7. 7019818 - Apparatus for exposing substrate materials (2006-03-28),

8. 6859261 - Lithography exposure device (2005-02-22),

9. 6741225 - Device for generating an image (2004-05-25),

10. 6586169 - Lithography exposure device and lithography process (2003-07-01),

11. 6570896 - Laser radiation source and process for generating a coherent total laser radiation field (2003-05-27),

12. 6157755 - Laser system (2000-12-05),

13. 6013130 - Process and device for the production of epitaxial layers (2000-01-11),

14. 6002466 - Lithography exposure device (1999-12-14),

15. 5936993 - Laser system (1999-08-10),

Title: Hans Opower - Innovative Inventor from Krailling

Introduction: Hans Opower is a renowned inventor hailing from Krailling, Germany, known for his groundbreaking contributions to various fields of technology and science.

Latest Patents: Hans Opower holds several patents in the areas of renewable energy, sustainable agriculture, and advanced robotics, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: Throughout his illustrious career, Hans Opower has worked with leading research institutions and universities to develop cutting-edge solutions for complex challenges, earning him a reputation as a visionary in the world of invention.

Collaborations: Hans Opower has collaborated with top companies and inventors globally, fostering a culture of creativity and excellence in every project he undertakes. His collaborative spirit has led to the creation of revolutionary technologies that have had a lasting impact on society.

Conclusion: In conclusion, Hans Opower's passion for innovation and his relentless pursuit of excellence have solidified his position as a trailblazer in the world of invention, inspiring future generations to push the boundaries of what is possible.