The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1999
Filed:
Mar. 26, 1998
Uwe Brauch, Stuttgart, DE;
Hans Opower, Krailling, DE;
Bernd Hoefflinger, Sindelfingen, DE;
Reinhard Springer, Renfrizhausen, DE;
Deutsches Zentrum fuer Luft -und Raumfahrt e.V., Bonn, DE;
Institutfuer Mikroelektronik Stuttgart, Stuttgart, DE;
Abstract
A lithography exposure device allows more effective production of small structures within a short time by lithography. The device includes a retainer for a substrate, an exposure unit for producing a light spot on the light-sensitive layer of the substrate, a motion unit for producing apparent motion between the exposure unit and the retainer, and a control unit for controlling the intensity and position of the light spot on the light-sensitive layer. The exposure unit has several solid-state lasers, and a focusing unit that guides the laser beam of each solid-state laser to a light spot of a defined light spot pattern. The entire light spot pattern and the retainer are displaceable relative to each other in an exposure motional direction. Moreover, the light spots of the light spot pattern which correspond to the form of the partial areas to be exposed can be activated or deactivated.