Deutsche Forschungsanstalt Fuer Luft- Und Raumfahrt E.v.

Deutsches Zentrum Fuer Luft-und Raumfahrt E.v

W.c. Heraeus Gmbh

Deutsche Forschungsanstalt Fur Luft-und Raumfahrt E.v.

Kleo Halbleitertechnik Gmbh & Co Kg

Universitaet Stuttgart Institut Fuer Strahlwerkzeuge

Kleo Ag

Other

Institut Fuer Mikroelektronik Stuttgart

Deutsche Forschungsanstalt

Kleo Maschinenbau Ag

Kleo Halbleitertechnik Bmbh & Co Kg

Deutsche Forschung -und Versuchsanstalt

Voest-alpine Stahl Linz Gmbh

Deutsches Zentrum Fur Luft-und Raumfahrt E.v.

Hans Opower

Uwe Brauch

Stefan Scharl

Adolf Giesen

Helmut Huegel

Rolf Nowack

Uwe Becker

Volker Ernst

Werner Spaeth

Friedrich Dausinger

Wolfram Schock

Reinhold Ebner

Manfred Klose

Norbert Bissinger

Hansjoerg Bochum

Bernd Hoefflinger

Marcus Scholl

Ralph Dieter

Erwin Gehringer

Kurt Koesters

Guido Hergenhan

Klaus Wessel

Bernd Luecke

Reinhard Springer

Klaus Juenger

Dirk Leinenbach

Heinrich Weyer

A processing system for plate-like objects is provided, with an exposure device and an object carrier with an object carrier surface for receiving the object. The exposure device and the carrier are movable relative to one another, such that the exact position of the object relative to the carrier is determinable. An edge detection device is provided which comprises at least one edge illumination unit having an illumination area, within which an object edge located in the respective object edge area has light directed onto it from the side of the carrier. At least one edge image detection unit is provided on a side of the object located opposite the carrier, the edge image detection unit imaging an edge section of the object edges located in the illumination area as an edge image, such that the respective edge image is detectable in its exact position relative to the carrier.

Processing system

An exposure apparatus for producing exposed structures in a photosensitive layer arranged on an object is provided. An object carrier and an exposure device, which can be moved relative to one another in an advance direction, enable exposure spots to be produced on the photosensitive layer in a position-controlled manner. The exposure device has at least one exposure unit with a series of radiation exit regions which are arranged successively in a series direction and from which exposure beams emerge, by means of each of which, passed through an imaging optical system, an exposure spot can be produced on the photosensitive layer and each of which can be deflected by a deflection unit in a deflection direction running transversely to the series direction, such that each exposure beam can produce exposure spots that at least partly overlap one another in a multiplicity of successive positions in the deflection direction.

Exposure apparatus

In the case of an exposure system for substrate bodies which carry a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier which carries the substrate body and has a substrate carrier surface, and an exposure device with an optics unit, the optics unit and the machine frame being movable relative to one another in a first direction and in a second direction, so that the photosensitive coating can be exposed by this relative movement in the first direction and in the second direction, in order to improve said system in such a way that a compact configuration is possible, despite in this case a substrate body with a very large extent in the first and the second direction, it is proposed that the exposure device has a guide cross-member for at least one guide carriage of the exposure device, the guide carriage carrying the optics unit, in that the guide carriage is guided on the guide cross-member to be movable in the first direction, and in that the guide cross-member is arranged on the machine frame to be movable in the second direction.

Exposure system

In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carried out, can be read out while sets of data of an additional macroline are being stored.

Method and device for producing exposed structures

In an exposure system for substrate members which bear a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier bearing the substrate member and an exposure device, wherein the substrate member and the exposure device can be moved relative to one another such that the photosensitive coating can be exposed as a result of this relative movement, it is suggested for an exposure of the photosensitive coating which is as precise as possible that the exposure device have an optics slide which can be moved in the second direction and on which an optical imaging device for the exposure of the substrate member is arranged, and that the exposure device have a light source unit which is arranged on the machine frame separately from the optics slide and has a plurality of light sources, the radiation of which can be coupled into the optical imaging device.

A lithography exposure device is provided which includes a mounting device for the layer sensitive to light, an exposure unit with several laser radiation sources, an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device, and a control for controlling intensity and position of exposure spots so that exposed structures which are as precisely structured as possible can be produced. A laser radiation field propagating in the direction of the light-sensitive layer generates each of the exposure spots from respective focal points and has a power density which leads in the conversion area in the light-sensitive layer to formation of a channel penetrating the light-sensitive layer with an index of refraction increased in relation to its surroundings by the Kerr effect and which guides the laser radiation field in a spatially limited manner.

Lithography exposure device having a plurality of radiation sources

The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.

Apparatus for exposing substrate materials

A lithography exposure device for producing exposed structures in a layer sensitive to light includes an exposure unit with a movement unit for the relative movement between the optical focusing element and a mounting device. A controler is provided for controlling intensity and position of the exposure spots, such that a plurality of conversion areas can be produced in the light-sensitive layer via the exposure spots. A controllable deflection device is provided between the laser radiation sources and the optical focusing means for the movement of the exposure spot in the deflection direction.

Lithography exposure device

In order to provide a device for generating an image on an image surface with N&times;M image elements which can be illuminated individually, comprising a plurality of semiconductor radiation sources, each of which generates radiation with at least one color, an optical imaging means with a beam guidance, by means of which a plurality of image elements can be illuminated with each of the semiconductor radiation sources, with which it is possible to generate an image on an image surface in as simple a manner as possible using radiation sources, it is suggested that the image surface ( ) be divided into a plurality of continuous image surface sections ( ), each comprising a two-dimensional ensemble of image elements ( ), that an illumination unit ( ) be associated with each of the image surface sections ( ) and that each illumination unit ( ) have at least one semiconductor radiation source ( ) and at least one optical imaging means ( ) of its own associated with this illumination unit ( ), this optical imaging means imaging a radiation outlet ( ) onto the corresponding image surface section ( ) in a free beam propagation.

Device for generating an image

In order to create a lithography exposure device for producing structures extending in a surface area in a light-sensitive layer, with which a radiation field can be generated in the light-sensitive layer and with a control for controlling the intensity and position of the radiation field in such a manner that by means of a large number of successive exposure steps a plurality of conversion areas can be generated, in which the material of the light-sensitive layer is converted from an initial state into an end state and which together result in the structures, with which it is possible to produce, without masks, structures which have in at least one direction an extension which is smaller than that of one of the radiation fields used, it is suggested that with at least some of the exposure steps the control generate radiation fields with a distribution of energy which makes the action of at least two radiation fields on the same conversion area necessary in order to transfer the material of the light-sensitive layer in this area into the converted end state.

Lithography exposure device and lithography process

A laser radiation source is provided with an array of N individual slave laser diodes in a predetermined surface area. Adjustable power supply networks enable adjustment of the slave laser diodes relative to one another for operation in a stable manner. The slave power supply has a separate power supply network for each slave laser diode. Each of the power supply networks can be adjusted with respect to the current supplied to the respective slave laser diode during a certain operating period. This enables adjusting the slave laser diodes relative to one another. The power supply networks can be connected in parallel and supplied by a common source.

Laser radiation source and process for generating a coherent total laser radiation field

In order to improve a laser system comprising a fiber bundle consisting of single mode fibers which form with a first end a fiber bundle end, at which a total radiation field, which can be imaged onto a target surface, is formed from laser radiation exiting from the first ends of the fibers, and which are coupled with a second end to a subsystem generating the laser radiation with at least one semiconductor laser, such that this also operates efficiently with semiconductor lasers or semiconductor laser amplifiers and can be realized in an inexpensive manner it is suggested that the subsystem comprise a plurality of semiconductor laser units operating parallel, that all the semiconductor laser units of the subsystem operate with the same wavelength in a phase-balanced manner relative to one another as a result of master laser radiation coupled into them and that individual laser radiation exiting from the individual semiconductor laser units of the respective subsystem be combined by means of a coupling device of the respective subsystem to form a coherent laser radiation field which can be coupled into one of the single mode fibers.

Laser system

Layers of compound semiconductor 60 are grown epitaxially on a substrate 40. One or more components 24 are removed from a target 14 by a supply of energy 18, and reacted with gas surrounding the target. The gas stream conveys the components through a nozzle 34 to achieve a uniform layer on the substrate.

Process and device for the production of epitaxial layers

A lithography exposure device allows more effective production of small structures within a short time by lithography. The device includes a retainer for a substrate, an exposure unit for producing a light spot on the light-sensitive layer of the substrate, a motion unit for producing apparent motion between the exposure unit and the retainer, and a control unit for controlling the intensity and position of the light spot on the light-sensitive layer. The exposure unit has several solid-state lasers, and a focusing unit that guides the laser beam of each solid-state laser to a light spot of a defined light spot pattern. The entire light spot pattern and the retainer are displaceable relative to each other in an exposure motional direction. Moreover, the light spots of the light spot pattern which correspond to the form of the partial areas to be exposed can be activated or deactivated.

In order to improve upon a laser system, comprising a laser-active medium which is arranged between mutually opposed waveguide surfaces of an optical waveguide and a resonator which by means of resonator mirrors defines a coherent resonator radiation field permeating the optical waveguide and from which a plurality of mutually coherent radiation fields issue, in such manner that higher laser output power levels can be attained it is proposed that the plurality of radiation fields are conducted as coupled-out radiation fields to a coupling element, and that the coupling element combines the plurality of radiation fields with a defined mutual phase relationship to form one single coherent output radiation field.

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Krailling, Germany

Hans Opower