White Plains, NY, United States of America

Hanfei Wang


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2017-2019

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):

Title: Innovations of Hanfei Wang

Introduction

Hanfei Wang is a prominent inventor based in White Plains, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on advanced semiconductor devices and methods that enhance performance and efficiency.

Latest Patents

One of Hanfei Wang's latest patents is for a "Stacked nanowire semiconductor device." This invention involves a method for forming a semiconductor device that includes a stack of nanowires, with specific lengths and arrangements to optimize performance. Another notable patent is titled "Structure and method to prevent EPI short between trenches in FinFET eDRAM." This patent addresses the challenges of semiconductor fin and conductive strap structures, providing solutions to enhance the reliability of deep trench capacitors.

Career Highlights

Hanfei Wang is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to work on cutting-edge technologies and contribute to the company's innovative projects in the semiconductor industry.

Collaborations

Throughout his career, Hanfei Wang has collaborated with notable colleagues, including William L. Nicoll and Michael A. Guillorn. These collaborations have further enriched his work and contributed to the development of advanced semiconductor technologies.

Conclusion

Hanfei Wang's contributions to semiconductor technology through his patents and work at IBM highlight his role as a leading inventor in the field. His innovative approaches continue to shape the future of semiconductor devices.

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