Han Yu

Title: Han Yu: Innovator in Semiconductor Technology

Introduction

Han Yu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving device performance and resource management in wireless communications.

Latest Patents

One of Han Yu's latest patents is the RFLDMOS device and manufacturing method. This invention provides an RFLDMOS device that incorporates an etching process to add dielectric layers between Faraday shielding covers. This innovation addresses the issue of parasitic resistance in Faraday shielding covers, which can lead to increased feedback capacitance and nonlinearity at high frequencies. As a result, the feedback capacitance and linearity of the RFLDMOS device are enhanced, improving its broadband performance.

Another notable patent is the uplink resource sharing method, base station, and terminal. This invention outlines a method for performing Listen Before Talk (LBT) on a granted subframe allocated to a terminal by a base station. It effectively reduces resource waste and minimizes the likelihood of increased uplink grant numbers due to scheduling failures.

Career Highlights

Han Yu has worked with several esteemed organizations, including Shanghai Huahong Grace Semiconductor Manufacturing Corporation and Shanghai Research Center for Wireless Communications. His experience in these companies has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Han Yu has collaborated with notable coworkers such as Zhengliang Zhou and Yang Liu. Their combined expertise has contributed to the advancement of their projects and innovations.

Conclusion

Han Yu is a distinguished inventor whose work in semiconductor technology has led to significant advancements in device performance and resource management. His contributions continue to impact the field positively.