Han-Shin Lee

Title: The Innovative Mind of Han-Shin Lee

Introduction

Han-Shin Lee, a prominent inventor based in Hwaseong-si, South Korea, has made significant contributions to the field of photomasks and adhesive technologies through his innovative patents. With a total of four patents to his name, Lee’s work emphasizes the intersection of materials science and semiconductor technology, showcasing his prowess as an inventive force in modern engineering.

Latest Patents

Han-Shin Lee's latest patents include groundbreaking developments in pellicle technology and reflective photomasks. One notable patent describes a pellicle that includes a water-soluble adhesive and a photomask assembly featuring this pellicle. The pellicle is designed with a membrane, a frame, and a specific formulation of a water-soluble adhesive made up of 40% to 55% by weight of a water-soluble acrylic adhesive material. Additionally, it consists of water or a water-alcohol solution in the same proportion, along with other additives. This innovation enhances the functionality and usability of photomasks in the fabrication of integrated circuits.

Another significant patent relates to reflective photomask blanks and the devices manufactured from them. It details a multi-layered reflection layer, a capping layer incorporating a transition metal, a passivation film that includes another transition metal alongside nitrogen, and a specially designed light absorption pattern. These innovations contribute to the efficiency and effectiveness of photomasks in semiconductor manufacturing processes.

Career Highlights

Han-Shin Lee has built a distinguished career at leading technology companies, most notably at Samsung Electronics and Fine Semitech Corporation. His tenure at these organizations has allowed him to hone his skills and leverage his innovative ideas into practical applications within the semiconductor industry.

Collaborations

Throughout his career, Han-Shin Lee has collaborated with talented individuals in the field, including notable coworkers Jae-Hyuck Choi and Hyung-ho Ko. These collaborative efforts have fostered a creative environment where groundbreaking technologies have been developed, pushing the boundaries of what is possible in photomask technology and semiconductor manufacturing.

Conclusion

The inventive contributions of Han-Shin Lee are shaping the future of semiconductor technology and materials science. With a focus on innovations such as water-soluble adhesives and advanced reflective photomask designs, he continues to pave the way for new advancements in the industry. His work stands as a testament to the potential of innovative thinking and collaboration in driving technological progress.