Samsung Electronics Co., Ltd.

Fine Semitech Corp.

Han-Shin Lee

Jae-Hyuck Choi

Hyung-ho Ko

Jung-jin Kim

Sungyong Cho

Chan-Uk Jeon

Jin-su Kim

Jong-Keun Oh

Byungchul Yoo

Jaehyuck Choi

Jin-sik Jung

Myungjun Kim

Jang-dong You

Jeonghwan Min

Bum-Hyun An

Jikang Kim

Kyoungchae Seo

Jeongsu Yang

Soo-Wan Koh

Donghoon Chung

Sung-wan Kim

Ik-jun Kim

Ikjun Kim

Hae-young Jeong

Soo-jung Kang

A pellicle including a water-soluble adhesive and a photomask assembly including the pellicle are provided. A pellicle may include a membrane, a pellicle frame, and a water-soluble adhesive disposed on the pellicle frame. The water-soluble adhesive may be prepared by a mixture including a water-soluble acrylic adhesive material in an amount of about 40% to about 55% by weight of the mixture, water or a solution of water and alcohol in an amount of about 40% to about 55% by weight of the mixture, and an additive in an amount of about 1% to about 5% by weight of the mixture.

Pellicle including a water-soluble adhesive and photomask assembly including the pellicle

A reflective photomask blank, a reflective photomask and an integrated circuit device manufactured by using a reflective photomask, include a multi-layered reflection layer; a capping layer on the multi-layered reflection layer and including a first transition metal; a passivation film contacting at least a portion of the capping layer on a side opposite to the multi-layered reflection layer and including a second transition metal and a nitrogen (N) atom; and a light absorption pattern covering a portion of the capping layer.

Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomask

A pellicle frame, including aluminum, aluminum oxide, and a transition metal.

Pellicle frame, pellicle, lithography apparatus, and method of fabricating the pellicle frame

A photomask includes an ion trapping layer and a method of manufacturing a semiconductor device uses the photomask. The photomask includes a transparent substrate and an ion trapping layer formed on a first region of the transparent substrate to trap ions present near the transparent substrate. In manufacturing a semiconductor device, a photosensitive film formed on a substrate is exposed through the photomask in which the ion trapping layer is formed on the transparent substrate, and the substrate is processed using the photosensitive film obtained as the result of the exposure.

Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask

Growing community of inventors

Hwaseong-si, South Korea

Han-Shin Lee