Han-Ping Chung

Title: Han-Ping Chung: Innovator in Semiconductor Technology

Introduction

Han-Ping Chung is a distinguished inventor based in Fongshan, Taiwan. He has made significant contributions to the field of semiconductor devices, with a focus on innovative structures that enhance electronic performance. With one patent to his name, Chung has established himself as an essential figure within the technology landscape.

Latest Patents

Han-Ping Chung holds a patent for a "CMOS structure with multiple spacers." This invention describes a semiconductor device that features a substrate with shallow trench isolation and source/drain regions located within it. The invention includes a gate stack situated on the substrate between the source/drain regions, along with a first gate spacer on the sidewall of the gate stack, and a second gate spacer on the sidewall of the first gate spacer. This design is intended to improve the efficiency and performance of semiconductor devices.

Career Highlights

Chung is affiliated with Taiwan Semiconductor Manufacturing Company Limited, a global leader in semiconductor manufacturing. His role in this innovative company allows him to collaborate with other talented professionals, further advancing the field of semiconductor technology.

Collaborations

During his career, Han-Ping Chung has worked alongside other esteemed professionals, including Bor Chiuan Hsieh and Chih-Hsin Ko. These collaborations contribute to the innovative atmosphere at Taiwan Semiconductor Manufacturing Company Limited and enable the team to push the boundaries of semiconductor design and manufacturability.

Conclusion

Han-Ping Chung's contributions to semiconductor technology demonstrate his dedication to innovation and excellence. With his patented work in CMOS structures, he continues to play a critical role in shaping the future of the semiconductor industry. His collaborations with other skilled professionals bolster the collective effort towards groundbreaking advancements in technology.