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For the Inventor, By the Inventor

Cupertino, CA, United States of America

Han-Ming Wu

This inventor holds 6 USPTO granted patents. Top assignee: Intel Corporation. Active years: 2003-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Han-Ming Wu. Retrieved from https://idiyas.com/inventor/han-ming-wu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 50.0

Average Co-Inventor Count = 2.2

ph-index = 3

Forward Citations = 33(Granted Patents)


Location History:

  • Shanghai, CN (2003 - 2004)
  • Cupertino, CA (US) (2004 - 2007)

Company Filing History:

goldMedal6 out of 56,290 
 
Intel Corporation
 patents

Years Active: 2003-2007

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6 patents (USPTO):Explore Patents
1. 7256872 - Purging gas from a photolithography enclosure between a mask protective device and a patterned mask (2007-08-14),
2. 7223448 - Methods for providing uniformity in plasma-assisted material processes (2007-05-29),
3. 6793717 - Apparatus for keeping contamination away from a mask during exposure with light (2004-09-21),
4. 6737358 - Plasma etching uniformity control (2004-05-18),
5. 6710845 - Purging gas from a photolithography enclosure between a mask protective device and a patterned mask (2004-03-23),
6. 6610123 - Filtered mask enclosure (2003-08-26),

Title: The Innovations of Han-Ming Wu

Introduction

Han-Ming Wu is a prominent inventor based in Cupertino, CA. He has made significant contributions to the field of photolithography and plasma-assisted material processes. With a total of 6 patents to his name, Wu's work has had a substantial impact on the semiconductor industry.

Latest Patents

One of his latest patents involves a method for purging gas from a photolithography enclosure between a mask protective device and a patterned mask. This invention describes a method and apparatus for removing an initial gas from a gas-filled enclosure and adding a purge gas with a different composition. The gas-filled enclosure includes a vent for adding the purge gas and removing the initial gas, utilizing pressure, diffusion, vacuum, or other means. Another notable patent focuses on providing uniformity in plasma-assisted material processes. This method involves implementing a shielding plate within a plasma chamber above a substrate, optimizing its dimensions, geometry, and location to generate a desired ion flux during the process.

Career Highlights

Han-Ming Wu is currently employed at Intel Corporation, where he continues to innovate and develop new technologies. His work at Intel has positioned him as a key player in advancing semiconductor manufacturing techniques.

Collaborations

Throughout his career, Wu has collaborated with notable colleagues, including Ronald J. Kuse and Giang T. Dao. These collaborations have further enhanced his contributions to the field.

Conclusion

Han-Ming Wu's innovative work in photolithography and plasma-assisted material processes showcases his expertise and dedication to advancing technology. His patents reflect a commitment to improving manufacturing processes in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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