The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2007
Filed:
Mar. 24, 2003
Applicants:
Han-ming Wu, Cupertino, CA (US);
He Long, Campbell, CA (US);
Inventors:
Han-Ming Wu, Cupertino, CA (US);
He Long, Campbell, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for providing uniformity in plasma-assisted material processes. A shielding plate is implemented within a plasma chamber above a substrate. The dimensions, geometry, and location of the shielding plate are optimized to generate a desired ion flux in a plasma-assisted material process conducted in a plasma chamber.
Wu, Han-Ming. (2007). Methods for providing uniformity in plasma-assisted material processes (U.S. Patent No. 7223448). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7223448
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile