This inventor holds 4 USPTO granted patents. Top assignees: Hewlett-Packard Development Company, L.p., Applied Materials, Inc.. Active years: 2007-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Sunnyvale, CA (US) (2007)
- Pala Alto, CA (US) (2014)
- Palo Alto, CA (US) (2010 - 2017)
Company Filing History:


Years Active: 2007-2017
Title: Han-Jun Kim: Innovator in Thin Film Technology
Introduction
Han-Jun Kim is a prominent inventor based in Palo Alto, California. He has made significant contributions to the field of thin film technology, holding a total of 4 patents. His innovative approaches have advanced the capabilities of various devices and processes in the semiconductor industry.
Latest Patents
One of Han-Jun Kim's latest patents is titled "Combinatorial Masking." This method employs a combinatorial etch mask that includes a top layer of a stack of material layers and a secondary mask on the top layer to etch other material layers of the stack. The method involves patterning a first layer at the top of the stack of material layers and providing the secondary mask on top of the patterned first layer. It further includes etching other material layers of the stack, including a second layer below the first layer, with the combinatorial mask and then etching the first layer along with the other material layers of the stack, excluding the second layer using the secondary mask as an etch mask.
Another notable patent is for a "Thin Film Device with Minimized Spatial Variation of Local Mean Height." This invention provides a thin film device that minimizes spatial variation of local mean height. The device features a substrate and at least one first structure with a spatially varying weighted local mean height determined by a layer weighting function. The first structure has a maximum height, a minimum height, and a variation for a given averaging area. A compensation structure is also provided upon the substrate, which has its own spatially varying weighted local mean height. Together, these structures combine to minimize spatial variation of a combined weighted local mean.
Career Highlights
Throughout his career, Han-Jun Kim has worked with notable companies such as Hewlett-Packard Development Company, L.P. and Applied Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.
Collaborations
Han-Jun Kim has collaborated with esteemed colleagues, including Carl Philip Taussig and Ping Mei. These partnerships have fostered an environment of innovation and creativity, leading to the development of impactful technologies.
Conclusion
Han-Jun Kim's contributions to thin film technology and his innovative patents highlight his role as a significant inventor in the field. His work continues to influence advancements in semiconductor technology and beyond.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile