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For the Inventor, By the Inventor

Hsinchu, Taiwan

Han-Chang Kang

This inventor holds 16 USPTO granted patents and 1 published patent application. Top assignee: Realtek Semiconductor Inc.. Active years: 2005-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Han-Chang Kang. Retrieved from https://idiyas.com/inventor/han-chang-kang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 16 

% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 5

Forward Citations = 68(Granted Patents)


Location History:

  • Irvine, CA (US) (2011)
  • Taipei Hsien, TW (2005 - 2012)
  • Hsinchu, TW (2008 - 2023)

Company Filing History:

goldMedal16 out of 3,297 
 
Realtek Semiconductor Inc.
 patents

Years Active: 2005-2023

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16 patents (USPTO):Explore Patents
1. 11588010 - Capacitor structure (2023-02-21),
2. 11587884 - Patterned ground shield device including multiple pattered ground shield layers (2023-02-21),
3. 11223328 - Dual-mode signal amplifying circuit of signal receiver (2022-01-11),
4. 11012167 - Device and method for detecting signal power (2021-05-18),
5. 10763793 - Dual-mode signal amplifying circuit of signal receiver (2020-09-01),
6. 9443838 - Method of fabricating integrated circuits, integrated circuit component mask layout set, and component photomask set (2016-09-13),
7. 8963594 - Phase-locked loop circuit (2015-02-24),
8. 8116063 - Semiconductor capacitor structure and layout pattern thereof (2012-02-14),
9. 7986726 - CMOS transceiver for communication system (2011-07-26),
10. 7612600 - DC offset calibration apparatus and method (2009-11-03),
11. 7382203 - Voltage controlled oscillator and delay circuit thereof (2008-06-03),
12. 7149128 - Data latch (2006-12-12),
13. 7132872 - Apparatus and method for generating a phase delay (2006-11-07),
14. 7084707 - Low noise amplifier and related method (2006-08-01),
15. 7071744 - Apparatus and method for detecting a phase difference (2006-07-04),

Title: The Innovations of Han-Chang Kang

Introduction

Han-Chang Kang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 16 patents. His work has been instrumental in advancing the capabilities of electronic devices.

Latest Patents

One of Han-Chang Kang's latest patents is a patterned ground shield device that includes multiple patterned ground shield layers. This innovative device features a first patterned ground shield layer located on a first layer and a second patterned ground shield layer on a second layer. The first layer consists of a plurality of first strip-shaped structures made from an oxide diffusion material, while the second layer contains second strip-shaped structures made from a conductive material. These structures are interlaced to enhance performance. Another notable patent is a capacitor structure that includes a first metal structure, a second metal structure, and a dielectric material. The second metal structure is positioned below the first, and both structures consist of at least three conductive components arranged in a fish-bone shape, with the dielectric material strategically placed in various isolators.

Career Highlights

Han-Chang Kang is currently employed at Realtek Semiconductor Inc., a leading company in the semiconductor industry. His work at Realtek has allowed him to focus on developing cutting-edge technologies that improve electronic device functionality and efficiency.

Collaborations

Throughout his career, Han-Chang has collaborated with talented individuals such as Ka-Un Chan and Chao-Huang Wu. These partnerships have fostered innovation and contributed to the successful development of various technologies.

Conclusion

Han-Chang Kang's contributions to the field of semiconductor technology are noteworthy and impactful. His innovative patents and collaborations reflect his dedication to advancing electronic device capabilities. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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