The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Oct. 08, 2008
Ta-hsun Yeh, Hsin-Chu, TW;
Han-chang Kang, Taipei Hsien, TW;
Ta-Hsun Yeh, Hsin-Chu, TW;
Han-Chang Kang, Taipei Hsien, TW;
Realtek Semiconductor Corp., Hsinchu, TW;
Abstract
The present invention provides a metal-oxide-metal (MOM) capacitor structure composed of a first capacitor and a second capacitor. The MOM capacitor structure has a plurality of symmetrical branch sections, which form an interdigitated structure along a plurality of ring contours. The MOM capacitor structure has an optimal geometrical symmetry, and therefore a better capacitance matching effect can be obtained, and the MOM capacitor structure has a higher unit capacitance. In addition, a capacitance value ratio between the first capacitor and the second capacitor can be adjusted according to different requirements in the MOM capacitor structure. Furthermore, the MOM capacitor structure of the present invention does not need additional masks, and the process cost is cheaper. In addition, due to the semiconductor process improvement, a large amount of metal layers can be stacked, and since the distance between the metal layers becomes smaller, the unit capacitance becomes higher.