This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2009-2026.
Company Filing History:
Years Active: 2009-2026
Title: Han Byoul Kim: Innovator in Particle Contamination Prevention
Introduction
Han Byoul Kim is a notable inventor based in Chonan, South Korea. He has made significant contributions to the field of substrate processing, particularly in methods aimed at reducing particle contamination. With a total of 4 patents to his name, Kim's work is recognized for its innovative approaches to enhancing processing chamber efficiency.
Latest Patents
One of Han Byoul Kim's latest patents is focused on "Power loading substrates to reduce particle contamination." This method involves preheating substrates within a processing chamber to create a thermophoresis effect. This effect helps prevent particles that are not adhered to surfaces from settling on the substrate. The patent outlines two primary methods for increasing substrate temperature: plasma loading and high-pressure loading. Plasma loading utilizes an inert gas plasma to heat the substrate, while high-pressure loading involves raising the chamber pressure to between about 1 Torr and 10 Torr during heating. By rapidly increasing the substrate temperature before processing, the likelihood of particle contamination is significantly reduced.
Career Highlights
Han Byoul Kim is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at this organization has allowed him to develop and refine his innovative techniques for substrate processing.
Collaborations
Throughout his career, Kim has collaborated with several talented individuals, including Beom Soo Park and Soo Young Choi. These collaborations have contributed to the advancement of his research and the successful implementation of his patented methods.
Conclusion
Han Byoul Kim is a distinguished inventor whose work in reducing particle contamination in processing chambers has made a significant impact in the field. His innovative methods and collaborations continue to drive advancements in substrate processing technology.