This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Intel Corporation. Active years: 2014-2022.
Location History:
- Hillsboro, OR (US) (2014)
- Portland, OR (US) (2022)
Company Filing History:
Years Active: 2014-2022
Title: Hale Erten: Innovator in Geometric Pattern Design
Introduction
Hale Erten is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of geometric pattern design, holding 2 patents that showcase his innovative approach to solving complex design challenges.
Latest Patents
One of Hale's latest patents is titled "Image morphing to meet desired constraints in geometric patterns." This method involves identifying a first geometric pattern that failed a design rule check and a second geometric pattern that passed the design rule check. Hale's technique morphs the first geometric pattern based on the second to generate a morphed geometric pattern that successfully passes the design rule check. The first geometric pattern is then replaced with the morphed version.
Another significant patent is "Photolithography mask design simplification." In this innovation, a target mask design is optimized for a photolithography mask. The medial axes of the design and assist features on the optimized mask are identified and simplified to lines. Lines that are distant from respective design features are pruned, and the remaining lines are simplified and thickened to form assist features.
Career Highlights
Hale Erten is currently employed at Intel Corporation, where he applies his expertise in geometric pattern design to advance the company's technological innovations. His work has contributed to the development of more efficient design processes in the semiconductor industry.
Collaborations
Hale collaborates with talented coworkers, including Vivek K Singh and Allan Gu, who share his passion for innovation and contribute to the success of their projects.
Conclusion
Hale Erten is a distinguished inventor whose work in geometric pattern design has led to valuable patents that enhance design efficiency. His contributions at Intel Corporation and collaborations with skilled colleagues further underscore his impact in the field.