Intel Corporation

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Vivek K Singh

Bikram Baidya

John A Swanson

Allan Gu

Abde Ali Hunaid Kagalwalla

Omkar S Dandekar

Bikram Baidva

Mengfei Yang-Flint

A method includes identifying a first geometric pattern that failed a design rule check, identifying a second geometric pattern that passed the design rule check, morphing the first geometric pattern based on the second geometric pattern to generate a morphed geometric pattern, wherein the morphed geometric pattern passes the design rule check, and replacing the first geometric pattern with the morphed geometric pattern.

Image morphing to meet desired constraints in geometric patterns

A photolithography mask design is simplified. In one example, a target mask design is optimized for a photolithography mask. Medial axes of the design and assist features on the optimized mask are identified. These are simplified to lines. Lines that are distant from a respective design feature are pruned. The remaining lines are simplified and then thickened to form assist features.

Photolithography mask design simplification

Growing community of inventors

Portland, OR, United States of America

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