Tokyo, Japan

Hajime Nakamura

This inventor holds 16 USPTO granted patents and 6 published patent applications and 10 EPO patents, primarily in Image Forming Technology. Top assignees: Kabushiki Kaisha Toshiba, Nisshin Steel Co., Ltd., Kokusai Denshin Denwa Kabushiki Kaisha. Active years: 1983-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hajime Nakamura. Retrieved from https://idiyas.com/inventor/hajime-nakamura-7jko884o

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 93.8

 

Average Co-Inventor Count = 2.9

ph-index = 9

Forward Citations = 176(Granted Patents)


Location History:

  • Kure, JP (1983 - 1984)
  • Hiroshima, JP (1987)
  • Tokyo, JP (1987 - 2022)

Company Filing History:


Years Active: 1983-2026

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Areas of Expertise:
Laser Gas Analyzer
Sensor Drive Circuit
Image Forming Apparatus
Pressure-Sensitive Roller
Integrated Circuit
Automatic Document Feeder
Silicon Determination
Photoelectric Transducer
Epitaxially Grown Crystal
Oxygen Probe
Paper Feeding Apparatus
Molten Metal Sampling
16 patents (USPTO):Explore Patents

Title: Hajime Nakamura: Innovator in Sensor Technology and Crystal Growth

Introduction

Hajime Nakamura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of sensor technology and crystal growth, holding a total of 16 patents. His innovative work has had a lasting impact on various industries.

Latest Patents

One of his latest patents is a "Sensor drive circuit with improved temperature characteristic compensation." This invention involves a sensor drive circuit designed to drive a sensor with a current. The drive current exhibits a reverse temperature characteristic in relation to the output voltage of the sensor. The circuit includes a first current source that generates a first current with a positive temperature characteristic and a second current source that produces a second current with a negative temperature characteristic. The combination of these currents allows for enhanced sensor performance.

Another notable patent is the "Method for production of multi-layered epitaxially grown crystal and apparatus therefor." This invention features a unique arrangement of melt receptacles and holders for aligning crystalline substrates. The design ensures that the melt used for crystal growth is discharged without introducing harmful oxide films or microcrystals, allowing for the growth of high-quality multi-layered crystals.

Career Highlights

Hajime Nakamura has worked with several esteemed companies, including Toshiba Corporation and Nisshin Steel Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative technologies.

Collaborations

Throughout his career, Nakamura has collaborated with notable coworkers such as Jun Sakakibara and Takaharu Moriya. These partnerships have fostered a creative environment that has led to groundbreaking advancements in their respective fields.

Conclusion

Hajime Nakamura's contributions to sensor technology and crystal growth exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving performance and quality in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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