This inventor holds 6 USPTO granted patents and 4 published patent applications. Top assignees: Wuhan Yuwei Optical Software Co., Ltd., Wuhan Yuwei Optical Software Co., Ltd.. Active years: 2023-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
5 out of 5 
1 out of 1 Years Active: 2023-2026
Title: Innovations of Haiqing Wei in Photolithography
Introduction
Haiqing Wei is a prominent inventor based in Hubei, China. He has made significant contributions to the field of photolithography, holding a total of 6 patents. His work focuses on optimizing photolithographic processes, which are crucial in the manufacturing of semiconductors and other high-precision devices.
Latest Patents
One of his latest patents is a "Photolithographic mask optimization method and system without border defects." This innovation provides methods and systems for optimizing photolithographic masks to eliminate border defects. The approach utilizes two sets of meshes, odd and even splitting, to obtain slices and correct mask patterns in a single iteration process. This circular iteration continues until all slices meet error requirements, effectively mitigating boundary effects.
Another notable patent is the "Optical imaging method, device and system for photolithography system." This invention includes methods and devices for simulating optical imaging in photolithography. It determines a photolithographic imaging model based on a transmission cross coefficient and mask near-field distribution. The use of a Lanczos method to solve the transmission cross coefficient enhances simulation efficiency and precision, preventing symmetry breaking caused by floating-point errors.
Career Highlights
Haiqing Wei is currently employed at Wuhan Yuwei Optical Software Co., Ltd. His work at this company has allowed him to further develop his innovative ideas and contribute to advancements in optical software solutions.
Collaborations
He collaborates with notable colleagues such as Xianhua Ke and Zhikang Zhou, who share his passion for innovation in the field of photolithography.
Conclusion
Haiqing Wei's contributions to photolithography through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in optical technologies and manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile