The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2024
Filed:
Nov. 23, 2022
Wuhan Yuwei Optical Software Co., Ltd., Hubei, CN;
Haiqing Wei, Hubei, CN;
Xianhua Ke, Hubei, CN;
WUHAN YUWEI OPTICAL SOFTWARE CO., LTD., Hubei, CN;
Abstract
Light source calibration methods and systems employed in source mask optimization are provided. The method includes: initializing a light source pattern and a mask pattern; using an SMO algorithm to iteratively optimize the light source pattern and the mask pattern; using a pre-established light source error correction model to correct the light source pattern after each iterative optimization, and updating the light source pattern after each iterative optimization with a corrected light source pattern in a current iteration process. The light source error correction model is established according to an input and output data set consisting of an input target light source pattern and an output actual light source pattern of a PIS. The method includes determining, according to an evaluation criterion or a condition of convergence of iteration of the SMO algorithm, whether the optimization meets a requirement.