The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Nov. 23, 2022
Wuhan Yuwei Optical Software Co., Ltd., Hubei, CN;
Haiqing Wei, Hubei, CN;
Xianhua Ke, Hubei, CN;
WUHAN YUWEI OPTICAL SOFTWARE CO., LTD., Hubei, CN;
Abstract
Methods, devices, and systems of optical imaging simulation for a photolithography system are provided, including: determining a photolithographic imaging model based on a transmission cross coefficient and mask near-field distribution, solving a transmission cross coefficient based on a Lanczos method, using a parity operator to ensure the symmetric properties of the transmission cross coefficient in the numerical solution process to obtain a characteristic kernel functions of the transmission cross coefficient, and solving a photolithographic imaging model by combining the mask near-field distribution and each characteristic kernel function, and obtaining an aerial image of the mask by simulation. The methods, devices, and systems provided can prevent symmetry breaking caused by floating-point errors and improve simulation efficiency as well as simulation precision of a photolithographic imaging system.