The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Nov. 23, 2022
Wuhan Yuwei Optical Software Co., Ltd., Hubei, CN;
Haiqing Wei, Hubei, CN;
Xianhua Ke, Hubei, CN;
WUHAN YUWEI OPTICAL SOFTWARE CO., LTD., Hubei, CN;
Abstract
Methods and systems of photolithographic mask optimization without border defects are provided. Two sets of meshes of odd splitting and even splitting performed in a staggered manner are used to obtain slices, and the mask patterns of the slices obtained by the odd splitting and even splitting are corrected once in sequence in a single iteration process. The iteration process is executed circularly until all slices meet the requirements on error, so as to eliminate the impact of a boundary effect. The two sets of splitting meshes consist of different partitions, thereby avoiding the problem of border defects caused by single splitting of a mask layout of a traditional mask optimization method.