Haifeng Sheng

Title: Haifeng Sheng: Innovator in Integrated Circuits

Introduction

Haifeng Sheng is a prominent inventor based in Singapore, known for his contributions to the field of integrated circuits. With a total of 5 patents to his name, he has made significant advancements in semiconductor technology.

Latest Patents

Among his latest patents, Haifeng Sheng has developed innovative solutions such as integrated circuits that include a dummy metal feature and methods of forming the same. This patent describes an integrated circuit that features a semiconductor substrate with an isolated well, along with a multilayer metallization stack that includes a metal layer, a functional via, and a dummy metal feature. The design ensures that the metal layer is in electrical communication with the isolated well through a contact, enhancing the functionality of the integrated circuit. Another notable patent involves a semiconductor device with a temporary plasma discharge path, which effectively discharges plasma charge collected in a device well during the back-end-of-line (BEOL) process. This temporary discharge path is rendered non-functional after processing, allowing the device to operate correctly.

Career Highlights

Haifeng Sheng is currently employed at Globalfoundries Singapore Pte. Ltd., where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in developing cutting-edge technologies that are essential for modern electronic devices.

Collaborations

Throughout his career, Haifeng has collaborated with talented professionals in the field, including Juan Boon Tan and Bei Chao Zhang. These collaborations have fostered a creative environment that has led to numerous advancements in integrated circuit technology.

Conclusion

Haifeng Sheng's contributions to the field of integrated circuits exemplify his dedication to innovation and excellence. His patents reflect a deep understanding of semiconductor technology and its applications in modern electronics.