Haifeng Pu

Title: Haifeng Pu: Innovator in Plasma Processing and Integrated Circuit Manufacturing

Introduction

Haifeng Pu is a notable inventor based in Shanghai, China. He has made significant contributions to the fields of plasma processing and integrated circuit manufacturing. With a total of 2 patents, his work reflects a deep understanding of complex systems and innovative methodologies.

Latest Patents

Haifeng Pu's latest patents include a "System and method to adjust a kinetics model of surface reactions during plasma processing." This patent describes a system that utilizes a metrology tool to acquire measurements of a sample. The system's controller processes these measurements to generate and adjust a surface kinetics model, ultimately simulating on-sample performance during plasma processing. Another significant patent is the "Method and system for manufacturing integrated circuit." This method involves obtaining measurement data from overlay marks on a wafer and projecting parameter sets to simulate compensation data for integrated circuit manufacturing.

Career Highlights

Throughout his career, Haifeng Pu has worked with Kla Corporation, where he applied his expertise in developing advanced technologies. His innovative approaches have contributed to the enhancement of manufacturing processes in the semiconductor industry.

Collaborations

Haifeng Pu has collaborated with notable professionals in his field, including Ankur Agarwal and Chad Huard. These collaborations have fostered a productive exchange of ideas and advancements in technology.

Conclusion

Haifeng Pu's contributions to plasma processing and integrated circuit manufacturing demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology in these critical areas.