This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2017.
Company Filing History:
Years Active: 2017
Title: Innovations of Hai Woo Lee
Introduction
Hai Woo Lee is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of plasma processing technology. His innovative methods have the potential to enhance the efficiency and effectiveness of etching processes in various applications.
Latest Patents
Hai Woo Lee holds 1 patent for a method of etching organic film. This patent describes a technique that allows for the etching of organic films while minimizing damage to the underlying layers. The method involves using a plasma processing apparatus where a processing gas containing hydrogen and nitrogen is supplied. The flow rate ratio of hydrogen gas to the processing gas is maintained between 35% and 75%. Additionally, a high-frequency bias power for ion attraction is set between 50 W and 135 W during the etching process.
Career Highlights
Hai Woo Lee is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing plasma processing technologies, which are crucial for the production of electronic components.
Collaborations
Throughout his career, Hai Woo Lee has collaborated with esteemed colleagues such as Kosuke Kariu and Toshihisa Ozu. These collaborations have contributed to the development of innovative solutions in the field of plasma processing.
Conclusion
Hai Woo Lee's contributions to the field of etching organic films demonstrate his commitment to innovation and excellence. His work continues to influence advancements in semiconductor technology.