Hagen Bartzsch

Title: Innovations of Hagen Bartzsch

Introduction

Hagen Bartzsch is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of materials science, particularly in the area of thin film deposition technologies. With a total of 2 patents, his work has advanced the methods used in various industrial applications.

Latest Patents

Hagen Bartzsch's latest patents include a method for depositing a layer using a magnetron sputtering device. This innovative method involves the use of at least two magnetron cathodes, each equipped with one target, and a separate power supply unit for each cathode. The process introduces both working and reactive gases into a vacuum chamber, allowing for precise control over the deposition process. Another significant patent is for depositing a piezoelectric film containing aluminum nitride (AlN). This method utilizes magnetron sputtering with a mixture of reactive nitrogen gas and inert gas, alternating between unipolar and bipolar pulse modes to achieve high-quality films.

Career Highlights

Throughout his career, Hagen Bartzsch has worked with esteemed organizations such as the Fraunhofer-Gesellschaft and Technische Universität Dresden. His experience in these institutions has allowed him to collaborate on various research projects, enhancing his expertise in thin film technologies.

Collaborations

Hagen has collaborated with notable colleagues, including Peter Frach and Jan Hildisch. Their combined efforts have contributed to advancements in the field of materials science.

Conclusion

Hagen Bartzsch's innovative work in the field of thin film deposition has led to significant advancements in technology. His patents reflect a commitment to improving industrial processes and materials.