Suwon-si, South Korea

Hadong Jin

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Samsung Electronics Ltd., Mico Ceramics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hadong Jin. Retrieved from https://idiyas.com/inventor/hadong-jin-hfafucrw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Hadong Jin - Innovator in Plasma Treatment Technology

Introduction

Hadong Jin is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of plasma treatment technology, particularly through his innovative designs and methods.

Latest Patents

Hadong Jin holds a patent for a susceptor and its manufacturing method. The patent describes a susceptor that enables uniform plasma treatment over the entire surface of a wafer. The design includes a dielectric plate with an upper surface for wafer loading and a lower surface facing the same. It features an inner RF electrode and an outer RF electrode buried within the dielectric plate. Notably, the height of the first plane, where the inner RF electrode is buried, is less than that of the second plane for the outer RF electrode.

Career Highlights

Throughout his career, Hadong Jin has worked with prominent companies such as Mico Ceramics Ltd. and Samsung Electronics Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Hadong Jin has collaborated with talented individuals in his field, including coworkers Sungyeol Kim and Jun Won Seo. Their collective efforts have furthered the development of innovative solutions in plasma treatment.

Conclusion

Hadong Jin's contributions to plasma treatment technology through his patent and career experiences highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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