The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Sep. 15, 2020
Samsung Electronics Co., Ltd., Suwon-si, KR;
Mico Ceramics Ltd., Anseong-si, KR;
Myungsub Jung, Suwon-si, KR;
Jun Won Seo, Anseong-si, KR;
Sungyeol Kim, Suwon-si, KR;
Sungyong Lim, Suwon-si, KR;
Hadong Jin, Suwon-si, KR;
Jaehyun Choi, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
MiCo Ceramics Ltd., Anseong-si, KR;
Abstract
Disclosed are a susceptor for enabling uniform plasma treatment over the entire surface of a wafer, and a manufacturing method therefor. Provided is the susceptor comprising: a dielectric plate having an upper surface on which a wafer is loaded, and a lower surface facing same; and an inner RF electrode and an outer RF electrode that are buried in the dielectric plate, wherein, with respect to the lower surface, the height of a first plane in which the inner RF electrode is buried is less than the height of a second plane in which the outer RF electrode is buried.