H J Wu

Title: H J Wu: Innovator in Semiconductor Technology

Introduction

H J Wu is a prominent inventor based in Hsinchu, Taiwan, known for his contributions to semiconductor technology. With a total of 5 patents, he has made significant advancements in the field, particularly in mask production and memory fabrication.

Latest Patents

One of H J Wu's latest patents is a proximity effect correction method for mask production. This innovative method integrates both the electron beam proximity effect correction and the optical proximity effect correction. It addresses the challenges of large computer-aided design pattern data files during mask production and enhances the image transfer process to the wafer using a stepper. The method involves providing a pattern for the mask, dividing the mask area into first and second area patches, and adjusting the electron beam exposure based on pattern density and light contrast. This results in a corrected pattern that is used for electron beam exposure operations to form the mask.

Another notable patent is a method of fabricating embedded dynamic random access memory (DRAM). This method utilizes dual damascence to create contact windows of varying depths by patterning only one dielectric layer. The metal layer formed within the connecting regions serves as interconnects without requiring further processing, streamlining the fabrication process.

Career Highlights

H J Wu has worked with notable companies in the semiconductor industry, including United Microelectronics Corporation and United Integrated Circuits Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Throughout his career, H J Wu has collaborated with esteemed colleagues such as Shih-Wei Sun and Jacob Chen. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

H J Wu's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key inventor in the industry. His work continues to influence advancements in mask production and memory fabrication, showcasing the importance of innovation in technology.