Boise, ID, United States of America

H Daniel Dulman

This inventor holds 14 USPTO granted patents. Top assignee: Micron Technology Incorporated. Active years: 2004-2008.


% Patents Active = 7.1

Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 2004-2008

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14 patents (USPTO):Explore Patents

Title: H Daniel Dulman: Pioneering Innovation in Radiation Patterning Tools

Introduction: H Daniel Dulman is an accomplished inventor based in Boise, Idaho, with a noteworthy record of 14 patents to his name. His pioneering work in the field of patterned reticles and radiation patterning tools has led to significant advancements in semiconductor manufacturing and design.

Latest Patents: Among his recent contributions, Dulman has developed innovative methods for forming patterned reticles. These methods allow designers to introduce and manipulate design features within reticle layouts prior to and after optical proximity correction. This flexibility in design methodology enhances the precision of the reticle patterns, which are crucial for effective semiconductor fabrication.

Another notable patent involves the creation of radiation patterning tools, which are essential for forming circular contacts in semiconductor arrays that may have varying pitches. This invention employs alternating phase shift techniques alongside rim shifters to maintain the circular integrity of contact openings, while also utilizing side-lobe-suppressing patterns to enhance performance and reliability.

Career Highlights: Dulman's career is distinguished by his tenure at Micron Technology Incorporated, where he applies his expertise in electronics and semiconductor technology to create innovative solutions. His work has not only contributed to the advancement of Micron's product offerings but has also influenced the industry-wide techniques for semiconductor manufacturing.

Collaborations: Throughout his career, Dulman has collaborated with other notable inventors such as William Arthur Stanton and John R C Futrell. These collaborative efforts have resulted in a variety of patents and innovations that push the boundaries of what is possible in electronics and semiconductor technology.

Conclusion: H Daniel Dulman's contributions to the field of semiconductor technology exemplify the spirit of innovation that drives the industry forward. With his extensive patent portfolio and ongoing collaborations, Dulman continues to be a significant figure in the landscape of modern inventions, shaping the future of electronics through his visionary work.

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