Chungcheongbuk-do, South Korea

Gyueng Hyuen Choe

This inventor holds 1 USPTO granted patent. Top assignee: En2core Technology, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gyueng Hyuen Choe. Retrieved from https://idiyas.com/inventor/gyueng-hyuen-choe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Gyueng Hyuen Choe: Innovator in Plasma Processing Technology

Introduction

Gyueng Hyuen Choe is a notable inventor based in Chungcheongbuk-do, South Korea. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to the development of a unique plasma processing system that enhances efficiency in multi-station operations.

Latest Patents

Gyueng Hyuen Choe holds a patent for a "Plasma process system for multi-station." This system includes a processing chamber with multiple stations, each equipped with its own plasma generator and inverter. The design features a sensing unit that measures the electric characteristics of the plasma generators, along with a controller that manages the inverters based on the sensing data. This invention represents a significant advancement in plasma processing technology.

Career Highlights

Choe is currently associated with En2core Technology, Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of plasma processing systems, making them more efficient and effective for various applications.

Collaborations

Choe collaborates with talented individuals such as Sae Hoon Uhm and Dong Jegal. Their combined expertise contributes to the success of their projects and the advancement of technology in their field.

Conclusion

Gyueng Hyuen Choe is a prominent figure in the realm of plasma processing technology, with a patent that showcases his innovative spirit. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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